File:Columnar grains 4.jpg

From Northwestern University Center for Atom-Probe Tomography
Revision as of 01:14, 19 October 2009 by Praneet (talk | contribs) (Figure 1-Short-circuit diffusion of Pt via grain boundaries in nickel monosilicide formed as a result of rapid thermal annealing of Ni0.95Pt0.05/Si (100) thin films at 420 K. Nickel, silicon and platinum atoms are shown in green, blue and red respectively)
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Figure 1-Short-circuit diffusion of Pt via grain boundaries in nickel monosilicide formed as a result of rapid thermal annealing of Ni0.95Pt0.05/Si (100) thin films at 420 K. Nickel, silicon and platinum atoms are shown in green, blue and red respectively.

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current01:14, 19 October 2009Thumbnail for version as of 01:14, 19 October 20091,024 × 620 (608 KB)Praneet (talk | contribs)Figure 1-Short-circuit diffusion of Pt via grain boundaries in nickel monosilicide formed as a result of rapid thermal annealing of Ni0.95Pt0.05/Si (100) thin films at 420 K. Nickel, silicon and platinum atoms are shown in green, blue and red respectively

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