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Type Lee, J. S.; Liu, K. S.; Chuang, F. Y.; Sun, C. Y.; Huang, C. M.; Lin, I. N.
  Publication Effect of Au buffer on the field emission characteristics of chemical vapor deposited diamond films Volume Journal Article
Pages 1997
  Abstract Applied Surface Science  
  Corporate Author Appl. Surf. Sci.  
Publisher 113-114  
Editor
  Summary Language 264-268 Series Editor Field Emission  
Abbreviated Series Title
  Series Issue ISSN  
Medium
  Expedition (up) Notes  
Call Number  
Contribution Id  
Serial URL ISBN  
no 2446
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Lee, C. G.; Ahn, H. Y.; Lee, J. D. Scaling-down of cone-like field emitter using LOCOS Journal Article 1995 Tech. Dig. 401-404 Field Emission no 2460
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Kim, I. H.; Lee, H.; C. G., L; Kim, Y. H.; Park, B. G.; Lee, J. D. Fabrication of metal field emitter arrays on polycrystalline silicon Journal Article 1997 Journal of Vacuum Science & Technology A J. Vac. Sci. Technol. A B15 468-471 Field Emission no 2478
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Kim, S. - J.; Ju, B. K.; Lee, Y. H.; Park, B. S.; Baik, Y. - J.; Lim, S.; Oh, M. H. Emission characteristic of diamond-tip field emitter arrays fabricated by transfer mold technique Journal Article 1997 Journal of Vacuum Science & Technology A J. Vac. Sci. Technol. A B15 499-502 Field Emission no 2480
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Lee, S.; Ju, B. K.; Lee, Y. H.; Jeon, D.; Oh, M. H. Fabrication and field emission study of gated diamondike-carbon-coated silicon tips Journal Article 1997 Journal of Vacuum Science & Technology A J. Vac. Sci. Technol. A B15 425-427 Field Emission no 2481
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Lee, S.; Lee, S.; Lee, S.; Jeon, D.; Lee, K. - R. Self-aligned silicon tips coated with diamondlike carbon Journal Article 1997 Journal of Vacuum Science & Technology A J. Vac. Sci. Technol. A B15 457-459 Field Emission no 2482
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Lee, Y. H.; Song, M. H.; Ju, B. K.; Shin, D. K.; Oh, M. H. Thin film phosphor prepared by physical vapor deposition for field emission display application Journal Article 1997 Journal of Vacuum Science & Technology A J. Vac. Sci. Technol. A B15 512-515 Field Emission no 2483
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Uh, H. S.; Kwon, S. J.; Lee, J. D. Process design and emission properties of gated n+ polycrystalline silicon field emitter arrays for flat-panel display applications Journal Article 1997 Journal of Vacuum Science & Technology A J. Vac. Sci. Technol. A B15 472-476 Field Emission no 2491
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Jung, Y. H.; Ju, B. K.; Jung, J. H.; Lee, Y. H.; Oh, M. H.; Kim, C. J. Characteristics on the gate insulator of metal tip field emitter arrays after wetting etching process Journal Article 1997 Japanese Journal of Applied Physics Jpn. J. Appl. Phys. 36 3576-3579 Field Emission no 2534
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Chi, E. J.; Shim, J. Y.; Baik, H. K.; Lee, S. M. Fabrication of amorphous-carbon-nitride field emitters Journal Article 1997 Applied Physics Letters Appl. Phys. Lett. 71 324-326 Field Emission; Field emitters; Eutectic silicon; Electric currents; Carbon; Electron affinities o improve siliconfield emitters, an amorphous-carbon-nitride (a-CN) coating was applied by helical resonator plasma-enhanced chemical vapor deposition. By this process, a-CN was very uniformly coated on silicon tips without any damage. Microstructural and electrical investigation of the silicon and a-CN coated field emitters were performed. a-CN coating lowered turn-on voltage and increased emission current. Negative electron affinity of carbon nitride is suggested for enhancing emission current. no NU @ karnesky @ 2540
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