| |
Record |
Links |
|
Type |
Mao, Zugang; Kim, Yeong-Cheol; Lee, Hi-Deok; Adusumilli, Praneet; Seidman, David N. |
| |
Publication |
NiSi crystal structure, site preference, and partitioning behavior of palladium in NiSi(Pd)/Si(100) thin films: Experiments and calculations |
Volume  |
Journal Article |
Pages |
2011 |
| |
Abstract |
Applied Physics Letters |
|
| |
Corporate Author |
|
|
Publisher |
99 |
|
Editor |
1 |
| |
Summary Language |
013106 |
Series Editor |
ab initio calculations; crystal structure; metallic thin films; nickel alloys; palladium alloys; silicon alloys; tomography; X-ray diffraction |
|
Abbreviated Series Title |
The crystal structure of a NiSi thin-film on a Si substrate and Pd site-substitution in NiSi and the partitioning behavior of Pd for NiSi(Pd)/Si(100) are investigated by x-ray diffraction (XRD), first-principles calculations, and atom-probe tomography (APT). The NiSi layer is a distorted orthorhombic structure from XRD patterns via experiments and calculations. We find that Pd has a strong driving force, 0.72 eV atom−1, for partitioning from Si into the orthorhombic NiSi layer. The calculated substitutional energies of Pd in NiSi indicate that Pd has a strong preference for Ni sublattice-sites, which is in agreement with concentration profiles determined by APT. |
| |
Series Issue |
|
ISSN |
|
|
Medium |
|
| |
Expedition |
Aip |
Notes |
|
|
Call Number |
|
|
Contribution Id |
|
|
Serial |
|
URL |
|
ISBN |
|
|
|
|
|
|
|
|
|
|
|
|
|
0003-6951 |
|
|
|
|
|
|
|
|
|
|
|
|
|
no |
|
NU @ karnesky @ ref10.1063/1.3606536 |
|
11169 |
| Permanent link to this record |
