NUCAPT Literature Database


1–1 of 1 record found matching your query (RSS):

Select All    Deselect All
 |   | 
  Record Links
Type Chi, E. J.; Shim, J. Y.; Baik, H. K.; Lee, S. M.
  Publication (up) Fabrication of amorphous-carbon-nitride field emitters Volume Journal Article
Pages 1997
  Abstract Applied Physics Letters  
  Corporate Author Appl. Phys. Lett.  
Publisher 71  
  Summary Language 324-326 Series Editor Field Emission; Field emitters; Eutectic silicon; Electric currents; Carbon; Electron affinities  
Abbreviated Series Title o improve siliconfield emitters, an amorphous-carbon-nitride (a-CN) coating was applied by helical resonator plasma-enhanced chemical vapor deposition. By this process, a-CN was very uniformly coated on silicon tips without any damage. Microstructural and electrical investigation of the silicon and a-CN coated field emitters were performed. a-CN coating lowered turn-on voltage and increased emission current. Negative electron affinity of carbon nitride is suggested for enhancing emission current.
  Series Issue ISSN  
  Expedition Notes  
Call Number  
Contribution Id  
Serial URL ISBN  
no NU @ karnesky @ 2540
Permanent link to this record
Select All    Deselect All
 |   | 

Personal tools
Seidman Group
Atom-Probe Tomography
Quick Search: